From lindalc@ecn.purdue.edu Thu Dec  8 21:20:20 2005
Date: Thu, 30 Oct 2003 10:45:29 -0500
From: Linda Campbell <lindalc@ecn.purdue.edu>
To: Michael D. Powell
Subject: Re: seminar announcements

Sorry for the inconvenience but the professor in charge has requested
that these seminars be sent out starting the Friday before the seminar
and other other day after that with a reminder on the final day.
I will forward your request to Prof Krause.

linda

At 10:24 AM 10/30/2003 -0500, you wrote:

      Hello,

      I have received four announcements from you sent to the
      ecegradstudent-list regarding this seminar--one each on Oct
      24th, 27th,
      29th, and 30th.  While I can understand the need for an
      initial
      announcement and a final reminder, four announcements sent to
      the same
      mailing list seems a bit excessive.

      Would it be possible to tone down the frequency of repeat
      announcements?
      Thanks,

      mdp

      ---------- Forwarded message ----------
      Date: Thu, 30 Oct 2003 08:09:13 -0500
      To: ecegradstudent-list@ecn.purdue.edu,
      ecefaculty@ecn.purdue.edu
      From: Linda Campbell <lindalc@ecn.purdue.edu>
      X-MD5-*Checksum*: 0354d223ed0d4bf98b850431bc033134  -
      X-Dupe-Seminar: Yes  3:00 10/30 ee270 r1 k4


      ECE GRADUATE SEMINAR

      DR KENNETH W. TOBIN
      Oak Ridge National Laboratory
      Oak Ridge, Tennessee

      Thursday, October 30, 2003
      3:00 PM, EE 270


      Optical Interferometric Imaging for Inspection and Metrology

      Interferometric imaging has the potential to extend the
      usefulness of
      optical microscopes by encoding small phase shifts that
      reveal information
      about topology and materials.  The Oak Ridge National
      Laboratory has
      developed a Spatial Heterodyne Interferometry (SHI) method
      and system for
      surface inspection and metrology.  The interferogram can be
      described by
      the well-known hologram equation at a fixed carrier frequency
      that is
      recorded directly on the surface of a charge coupled device
      (CCD) camera
      for analysis.  Unlike commercial phase shifting profilometry
      systems, the
      SHI technology encodes phase and amplitude in a single
      digital image,
      therefore facilitating near real-time processing and an
      ability to freeze
      motion in a single frame.  The SHI system at ORNL uses a
      532nm laser and
      has resolution in the plane of the surface of 266nm while
      achieving
      out-of-plane resolution of approximately 10nm.  The
      technology has also
      been extended to facilitate the mixing of two similar
      wavelengths to
      achieve greater depth measurements by mitigating phase
      wrapping.  Applications of the technology have been
      investigated for
      characterizing deep structures on semiconductor wafers (e.g.,
      contacts,
      vias, and trenches) and for performing inspection and
      metrology on
      phase-shifting photolithographic masks.  This presentation
      will review the
      base SHI technology, the extension to multiple wavelengths to
      achieve
      greater depth-of-field, and the transfer of the technology to
      the
      semiconductor industry through cooperative research.


      Kenneth W. Tobin

      Dr. Kenneth W. Tobin is a Corporate Research Fellow and Group
      Leader of the
      Image Science and Machine Vision Group at the Oak Ridge
      National
      Laboratory, Oak Ridge, Tennessee.  The group performs applied
      computer
      vision research and development in industrial inspection,
      biomedical
      imaging, and national security.  He performs research in
      non-destructive
      test and analysis, image processing and image-based
      metrology, object
      segmentation, feature generation, and classification from
      multi-modal
      imagery for process characterization.  He has authored and
      co-authored over
      120 publications and he currently holds six U.S. Patents with
      five
      additional patents pending in the areas of computer vision,
      photonics,
      radiography, and microscopy.  Dr. Tobin is a Fellow of the
      International
      Society for Optical Engineering (SPIE) where he is currently
      founder and
      Chairman of the conference on Data Analysis and Modeling for
      Process
      Control, part of SPIEs Microlithography Symposium.  Dr. Tobin
      is also a
      member of the Institute of Electrical and Electronics
      Engineers (IEEE)
      where he was the first invited U.S. organizer of the 6th
      International
      Conference on Quality Control by Artificial Vision held in
      2003.  Dr. Tobin
      was the Tennessee Academy of Science's Industrial Scientist
      of the Year in
      2001 for his work in image-based analysis and metrology.  He
      was the
      recipient of the R&D 100 Award by R&D Magazine in 2002 for
      his work in
      content-based image retrieval, and he was the recipient of
      the Southeast
      and National Federal Laboratory Consortium Awards for
      Excellence in
      Technology Transfer for his work in digital holography in
      2002.  He has a
      Ph.D. in Nuclear Engineering from the University of Virginia,
      Charlottesville, Virginia, and an MS in Nuclear Engineering
      and a BS in
      Physics from Virginia Tech., Blacksburg, Virginia.

      ECE Faculty Host:  Professor Jan Allebach

      http://www.purdue.edu/ece/Gradseminar